A typical optical system for lithography contains 11 components, so the total throughput of EUV light is only around ... laser-plasma source and zone-plate optics to focus the radiation.

China is advancing in extreme ultraviolet (EUV) lithography, with a domestically developed system undergoing testing at ...

EUV Tech (EUVT), a global leader in manufacturing at-wavelength EUV metrology equipment, is excited to announce the next ...

ASML and Imec this week established a five-year partnership designed to enable Imec's researchers and developers access to ...

A new metrology system has been developed that is based on X-ray diffraction microscopy in the EUV region and is ca-pable of measuring CD value and inspecting pattern defects with a high accuracy. The ...